The The Q300T D is a fully automatic, large chamber, dual-head sputter coater ideally suited for thin film applications and for conductive coating of scanning electron microscopy (SEM) specimens. The dual-head configuration allows two different oxidising or non-oxidising metals to be sequentially sputtered without the need to 'break' vacuum. A dual channel film thickness monitor option is available.
• Fully automatic touch screen control - rapid data input, simple operation
• Dual sputter head - for sequential sputtering of two different metals, ideal for many thin film applications
• A wide range of oxidising and non-oxidising targets are available
• Large chamber format
• Optional dual channel film thickness monitor (FTM) module
• Vacuum shut-down feature - leaves the process chamber under vacuum when not in use - improved vacuum performance
• Thick film capabilities - up to 60 minutes sputtering time without breaking vacuum
• Three-year warranty
Ideal for sputter coating of large specimens, thin film applications and SEM specimen coating
TThe Q300T D is designed for sequentially sputtering a range of oxidising and non-oxidising (noble) metals for scanning electron microscopy (SEM) and thin film applications. A key feature of the Q150T D is its ability to deposit two materials (up to five layers) without the need to break vacuum.
The Q300T D comes as standard with a chromium (Cr) target and gold (Au) target.
High-vacuum turbomolecular pumping
The Q300T D is fitted with an internally mounted 70 L/s turbomolecular pump, backed by a 50 L/m two-stage rotary pump (order separately). A Pirani vacuum measurement gauge (range: 1,000 mbar to 5 x 10-4 mbar) is included, but a full range gauge is available as an option. Typical ultimate vacuum levels of around 5 x 10-5mbar can be expected in a clean system after pre-pumping with dry nitrogen gas.
Dual head sputtering - for sequential sputtering
The Q300T D has two independent sputtering heads to allow sequential sputtering of two different metals without the need to ‘break’ vacuum, for example, a thin ‘seeding’ layer of chromium (Cr) followed by deposition of gold (Au). An automatic shutter mechanism enables cleaning of oxidising sputter targets and protects the second target and substrate during coatings. For single metal applications one target can be selected.
The Q300T D is fitted with a flat rotating specimen stage capable of accepting wafers up to 4"/100 mm in diameter. The rotation speed is variable between preset limits and the stage to sputtering head distance can be adjusted between 25-71 mm. A range of optional specimen stages can be fitted
Moulded case with colour touch screen
The Q300T D is presented in a custom moulded, one-piece case, allowing easy servicing access. The colour touch screen allows multiple users to input and store coating ‘recipes’. The case houses all the working components and includes an automatic bleed control that ensures optimum vacuum conditions during sputtering.
The vacuum chamber has an internal diameter of 283 mm/12” and comes with an integral implosion guard. A useful feature of the Q300T D is ‘vacuum shutdown’, which enhances vacuum performance by allowing the chamber vacuum to be maintained when the system is not in use.
Rapid data entry
At the operational heart of the Q300T D is a colour touch screen, which allows inexperienced or occasional operators to rapidly enter and store their own process data. For added convenience a number of typical sputter coating profiles are already stored.
he touch screen interface features maintenance prompts that highlight the time of last clean, coating time since last clean, system ‘on time’ and time of last service.
A suitable rotary vacuum pump is required. The Pfeiffer DUO 6 5 m3/hr two-stage rotary vacuum pump is ideal for this purpose. Dry pumping alternatives are also available.